"High performance modeling of modern deposition processes for optical coating nanotechnology"

"High performance modeling of modern deposition processes for optical coating nanotechnology"
Tikhonravov A.V., Kochikov I.V., Amotchkina T.V., Grigoriev F.V., Kondakova O.A., Sulimov V.B.

Applicability of the method of molecular dynamics (MD) to the simulation of modern processes of deposition of optical coatings is studied. The choice of physical and technological aspects of deposition processes is explained and the most meaningful parameters of computer simulation are estimated. The first results of MD simulation of silica dioxide film growth are discussed. These results demonstrate good perspectives of high performance modeling of deposition processes.

Keywords: high performance modeling, molecular dynamics, thin films, deposition processes

Tikhonravov A.V. e-mail: tikh@srcc.msu.su; Kochikov I.V. e-mail: igor@kochikov.ru; Amotchkina T.V. e-mail: tatiana@srcc.msu.su; Grigoriev F.V. e-mail: fedor.grigoriev@gmail.com; Kondakova O.A. e-mail: olga.kondakova@srcc.msu.su; Sulimov V.B. e-mail: vladimir.sulimov@gmail.com