Chemical Vapor Depositionæóðíàë

Ðåäêîëëåãèÿ

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• Êàóëü Àíäðåé Ðàôàèëîâè÷, ñ 1 ÿíâàðÿ 2004

Ñòàòüè, îïóáëèêîâàííûå â æóðíàëå ñòèëü:  îáû÷íûé | ÃÎÑÒ | plain | abbrv | acm | alpha | amsalpha | amsplain | apalike | ieeetr | siam

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  • 2014 Full CVD Reel-To-Reel Process to Obtain Perfectly Oriented Silicon Films on Metal Tapes with Oxide Buffer Layers,
  • Moyzykh M., Samoilenkov S., Amelichev V., Vasiliev A., Pozdnyakov M., Mankevich A., Tschepikov V., Kaul A.
  • â æóðíàëå Chemical Vapor Deposition, èçäàòåëüñòâî John Wiley & Sons Ltd. (United Kingdom), òîì 20, ? 10-11-12, ñ. 356-363 DOI
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  • 2013 Growth of a Carbon Nanotube Forest on Silicon using Remote Plasma CVD
  • Ismagilov Rinat R., Shvets Petr V., Zolotukhin Aleksey A., Obraztsov Alexander N.
  • â æóðíàëå Chemical Vapor Deposition, èçäàòåëüñòâî John Wiley & Sons Ltd. (United Kingdom), òîì 19, ? 10-11-12, ñ. 332-337 DOI
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  • 2012 Boron-doped Homoepitaxial Diamond CVD from Microwave Plasma-Activated Ethanol/Trimethyl Borate/Hydrogen Mixtures
  • Belousov M.E., Mankelevich Yu A., Minakov P.V., Rakhimov A.T., Suetin N.V., Khmelnitskiy R.A., Tal A.A., Khomich A.V.
  • â æóðíàëå Chemical Vapor Deposition, èçäàòåëüñòâî John Wiley & Sons Ltd. (United Kingdom), òîì 18, ? 10-12, ñ. 302-308 DOI
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  • 2009 Novel low melting point barium and strontium precursors for the MOCVD growth of barium-strontium-titanate films
  • Kuzmina N., Malkerova I., Alikhanyan A., Tsymbarenko D., Lysenko K., Kreinin O., Shuster G., Lakin E., Zolotoyabko E.
  • â æóðíàëå Chemical Vapor Deposition, èçäàòåëüñòâî John Wiley & Sons Ltd. (United Kingdom), òîì 15, ñ. 342-349
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  • 2004 A brief overview of CVD research at IOPW, Technical University of Braunschweig
  • Arndt J., Decker W., Keune H., Klippe L., Krause U., Metz C., Nemetz W., Nubian K., N?rnberg A., Pulver M., Samoilenkov S.V., Schmidt J., Stadel O., Stiens D., Stolle R., Gorbenko O.Y., Kaul A.R., Korsakov I.E.
  • â æóðíàëå Chemical Vapor Deposition, èçäàòåëüñòâî John Wiley & Sons Ltd. (United Kingdom), òîì 10, ? 2, ñ. 61-66 DOI
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  • 2004 MOCVD of KNbO3 ferroelectric films and their characterization
  • Romanov M.V., Korsakov I.E., Kaul A.R., Stefanovich S.Y., Bolshakov I.A., Wahl G.
  • â æóðíàëå Chemical Vapor Deposition, èçäàòåëüñòâî John Wiley & Sons Ltd. (United Kingdom), òîì 10, ? 6, ñ. 318-324 DOI
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  • 2002 Low-temperature MOCVD of conducting, micrometer-thick, silver films
  • Samoilenkov S., Stefan M., Wahl G., Paramonov S., Kuzmina N., Kaul A.
  • â æóðíàëå Chemical Vapor Deposition, èçäàòåëüñòâî John Wiley & Sons Ltd. (United Kingdom), òîì 8, ? 2, ñ. 74-78 DOI
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  • 2000 Volatile surfactant-assisted MOCVD: Application to LaAlO3 thin-film growth
  • Molodyk A.A., Korsakov I.E., Novojilov M.A., Graboy I.E., Kaul A.R., Wahl G.
  • â æóðíàëå Chemical Vapor Deposition, èçäàòåëüñòâî John Wiley & Sons Ltd. (United Kingdom), òîì 6, ? 3, ñ. 133-138 DOI
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  • 1998 Deposition of Cubic Boron Nitride in Hydrogen Plasma
  • Igor Konyashin, Joachim Bill, Fritz Aldinger, Valery Khvostov, Alexey Bregadze, Malvina Guseva, Vladimir Babaev
  • â æóðíàëå Chemical Vapor Deposition, èçäàòåëüñòâî John Wiley & Sons Ltd. (United Kingdom), òîì 4, ? 4, ñ. 125-129
• • 1997 CVD of AlN films and some of their properties
  • Spitsyn B.V., Stoyan V.P., Kulakova I.I., Kochetkova E.I.
  • â æóðíàëå Chemical Vapor Deposition, èçäàòåëüñòâî John Wiley & Sons Ltd. (United Kingdom), òîì 5, ? 4, ñ. 318-322