Документ взят из кэша поисковой машины. Адрес оригинального документа : http://num-meth.srcc.msu.ru/english/zhurnal/tom_2013/v14r135.html
Дата изменения: Mon Feb 10 17:19:38 2014
Дата индексирования: Fri Feb 28 00:32:33 2014
Кодировка: IBM-866
яЁѓ "An algorithm of high performance modeling of optical nanocoating deposition processes"  
"An algorithm of high performance modeling of optical nanocoating deposition processes"
Grigoriev F.V., Kochikov I.V., Kondakova O.A., Sulimov V.B., Tikhonravov A.V.

A new algorithm of high performance modeling of deposition processes for optical thin films deposition is proposed. The algorithm is based on the molecular dynamics simulation at the atomistic level, which allows one to analyze the structure of the film on the scales from 1 Angstrom to tens nanometers. The parameters of the algorithm are defined using the results of modeling the interaction of high-energy silicon atoms with silica dioxide. First results of modeling using the proposed algorithm are discussed.

Keywords: high performance modeling, molecular dynamics, thin films, silica dioxide, film deposition

Grigoriev F.V., e-mail: fedor.grigoriev@gmail.com;   Kochikov I.V., e-mail: igor@kochikov.ru;   Kondakova O.A., e-mail: olga.kondakova@srcc.msu.su;   Sulimov V.B., e-mail: vladimir.sulimov@gmail.com;   Tikhonravov A.V., e-mail: tikh@srcc.msu.su тАУ Research Computing Center, Lomonosov Moscow State University; Leninskiye Gory, Moscow, 119991, Russia