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: http://danp.sinp.msu.ru/Articles_GCIB_NIMB.htm
Дата изменения: Sun Oct 9 22:03:06 2005 Дата индексирования: Mon Oct 1 20:35:58 2012 Кодировка: Windows-1251 |
C. Heck, T. Seki, T. Oosawa, M.
Chikamatsu, N. Tanigaki, T. Hiraga, J. Matsuo
2.
Computer simulation of surface modification with ion beams
Z. Insepov, A. Hassanein, D. Swenson,
M. Terasawa
3. Small
B-cluster ions induced damage in silicon
Jiarui Liu, Xuemai Wang, Shao Lin, Hui Chen, Wei-Kan Chu
4. Interactions of
ethanol cluster ion beams with silicon surfaces
G.H. Takaoka, H. Noguchi, M. Kawashita
5. Production of
liquid cluster ions and their application to surface etching
G.H. Takaoka, H. Noguchi, Y. Hironaka
6. Molecular
dynamics study of the angular dependence of reactive cluster impacts
Takaaki Aoki, Jiro Matsuo
R. MacCrimmon, J. Hautala, M. Gwinn, S. Sherman
8. Irradiation
of silicon surface by Ar cluster ion beam: Cluster size efects
Y. Nakayama, S. Houzumi, N. Toyoda, K. Mochji, T. Mitamura, I. Yamada
9.
Smoothing RF cavities with gas cluster ions to mitigate high voltage breakdown
D.R. Swenson, E. Degenkolb, Z. Insepov, L. Laurent, G. Scheitrum
10. Energy
distributions of high current cluster ion beams
T. Seki, J. Matsuo
11.
Analysis of charge, mass and energy of large gas cluster ions and applications
for surface processing
D.R. Swenson
12. Development
of a size-selected gas cluster ion beam system for low-damage processing
Noriaki Toyoda, Shingo Houzumi, Isao Yamada
13.
Smoothing of ZnO .lms by gas cluster ion beam
H. Chen, S.W. Liu, X.M. Wang, M.N. Iliev, C.L. Chen, X.K. Yu, J.R. Liu, K.
Ma, W.K. Chu
14.
Cluster size dependence of sputtering yield by cluster ion beam irradiation
T. Seki, T. Murase, J. Matsuo
15.
Recent advances in R&D of gas cluster ion beam processes and equipment
Isao Yamada, Noriaki Toyoda
Некоторые работы
по технологии кластерных ионов, ранее опубликованные в NIMb в 2003 г.:
16.
Cluster ion beam process technology
Isao Yamada, Jiro Matsuo, Noriaki Toyoda
Collaborative Research Center for Cluster Ion Beam Process Technology
NIMB 206 (2003) 820
17.
Gas cluster ion beam applications and equipment
Allen Kirkpatrick
NIMB 206 (2003) 830
18.
Atomistic study of cluster collision on solid surfaces
Jiro Matsuo, Toshio Seki, Takaaki Aoki, Isao Yamada
NIMB 206 (2003) 838
19. Modeling of surface smoothing process by cluster ion beam irradiation
A. Nakai, T. Aoki, T. Seki, J. Matsuo, G.H. Takaoka, I. Yamada
NIMB 206 (2003) 842
20. Defect
characteristics by boron cluster ion implantation
Takaaki Aoki, Jiro Matsuo, Gikan Takaoka, Noriaki Toyoda, Isao Yamada
NIMB 206 (2003) 855
21. Titanium-dioxide film formation using gas
cluster ion beam assisted deposition technique
O. Nakatsu, J. Matsuo, K. Omoto, T. Seki, G. Takaoka, I. Yamada
NIMB 206 (2003) 866
22. Reduction of surface roughness by Ta2O5 film formation with O2 cluster ion assisted deposition
Y. Fujiwara, N. Toyoda, K. Mochiji, T. Mitamura , I. Yamada
NIMB 206 (2003) 870
23.
Stable optical thin film deposition with O2 cluster ion beam assisted deposition
N. Toyoda, Y. Fujiwara, I. Yamada
NIMB 206 (2003) 875
24.
Generation of the large current cluster ion beam
T. Seki, J. Matsuo, G.H. Takaoka, I. Yamada
NIMB 206 (2003) 902
25.
Virus inactivation studies using ion beams, electron
and gamma irradiation
Eduardo E. Smolko, Jorge H. Lombardo
NIMB 236 (2003) 249
26. Gas cluster ion beams for wafer processing
M.E. Mack
NIMB 237 (2003) 235
27. Development of polyatomic ion beam system using liquid organic materials
G.H. Takaoka, Y. Nishida, T. Yamamoto, M. Kawashita
NIMB 237 (2003) 240
28. Development of 1 mA cluster ion beam source
T. Seki, J. Matsuo
NIMB 237 (2003) 245
29. Crater formation and sputtering by cluster impacts
Z. Insepov, L.P. Allen, C. Santeufemio, K.S. Jones, I. Yamada
NIMB 206 (2003) 846
30. Cluster species and cluster size dependence of damage formation by
cluster ion impact
Takaaki Aoki, Jiro Matsuo, Gikan Takaoka, Isao Yamada
NIMB 206 (2003) 861