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1. Mingjie Liu, Vasilii I. Art yukho v, Hoonk yung Lee, Fangbo Xu, and Boris I. Yak obson. ACS Nano, 2013. DOI: 10.1021/nn404177r. 1-15.


.. . .. , , , , . . . , , SiO2 = 3,9. M. Ishigami /1/ , h . /2/ , h. h . - . 1. 2. Ishi gami M., Chen J. H., Cullen W. G., Fuhrer M. S., Williams E. D Ato mic Structure of Graphene on SiO2// Nano Lett., 7, 2007, 1643. Rado vi I., Hadzi evski Lj. Polarization of supported graphen e b y slowl y mo vin g charges // PHYSICAL REVIEW, B 77, 2008, 075428.
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- () () /1/. - () , -, - . , - , , . , - , - . , , , - «», - - Ar+ 30 , . (400) , - , -. 1. Andriano va N.N., Borisov A.M., Mashkova E.S., Parilis E.S., Virgiliev Yu.S. // Horizons in World Physics, Nova Science Publishers, NY, USA, 2013, V. 280, P. 171-190

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Si . Si ~ 100 - . Ar+ 40 10 15 - 1016 -2. -200. Si . 680 0 60 ~ 26 . Ar+ Si . Si, 5·10 15 -2, 680 0 60 . ~ 14 10 15 -2, ~ 22 3·1015 -2 ~ 24 5·10 15 -2. + 7·1015 ­ 10 16 -2 , Si 680° . . , - . , .


. . , , () . , /1/. , /2/. - . /3/. , , ­ . , , . ­ . , . 1. 2. 3. . ., . . . .: , 1995. 176 . . ., . . . .: , 1985. 152 . . . // , 1992, . 8, . 27. . . , .. , .. , . , . . , , <111> . . , . - , . 1. . . , .. , .. , .. , .. , .. , .. , .. // . 2013. 2 (84) C.152-156.


.. 1), .. 1), .. 1), .. 1,2) 1) .. .., , 2) .., , HVEE 500 in-situ. (Ar, Fe, Xe .) (110) 100 - 300 1014 - 1016 /2 . <110> . , , . . . 109 Ag+/107 Ag+ . . « », , ( "", ) 109 Ag+/107 Ag+ , . , -, ( ) , 109Ag. 107Ag. . , -, 107Ag+ 109 Ag+. 109 Ag-S 107Ag-S. , . - . . , . . , , /1/. (26, 78 390 ) Ar 1 800 . E AM, - /2/. . .
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Gu velioglu G., Ma Pingping, He Xiao yi, Forrey R., Cheng Hansong // Phys. Rev. B, 2006, V. 73, I. 15, 155436. Bonitz M., Rosenthal L., Fujioka K. Zaporojtchenko, V. Faupel, F. Kersten, H. // 2012, V. 52, I. 12, 890.


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-15 /1/ , 0,96 0,25 . /2/ -15 0,25 0,7 400 1100. , . , , . -15 . . . - 420 , . 600-680. -15 , . 1. 2. . ., .., .. // , . , . 64. 2002, 4, . 747. . ., .., .. // . . 2004. .68, 3. . 438. .. , .. , .. , .. «», , () , , , . , , . , , : 1. ; 2. , . . , /1/ . . 1. Jablonski A., Salvat F., Powell C.J. NIST Electron Elastic Scattering CrossSection Database, Version 3.1. 2003


(001) Ni (001) Au .. , .. . .. , , , ­ , /1/, E0 . /2/. "" , , , . . 3.5% (001) Ni 6.9% (001) Au. [85.5, 88.5] ( = 90) 16.3% (001) Ni 29.0% (001) Au. , . [85.5, 88.5] 20.4%, 30.5%, 45.0%, 52.1% 58.6% = [59.3°, 60.7°], [62.2°, 63.6°], [65.0 °, 66.4°], [67.8°, 69.2 °] [70.5 °, 71.9 °] (001) Ni. 1. 2. .., .., .., .. // , 1997, 2, c. 77-92. .., .. // , 2014, 3, c. 81-92. - .. ,.. , .., .. - ., , ; arustamo v@ aie.uz ( ) , . , , . : : , - . . , : 1 - (), - (/), 3 - (), 4- (/ 2), 5- ( /2), (%). . , .. (*=0,0086). , , . « » - .. ,.. , .. , .. - ., , - - 2-5 , ( ), « » : , , . . , , . . , . , , , . ( 1500 0C D = 5.4*10-5 2/ , 1500 0C D = 8.4*10-5 2/ ). . : -, (C~ 0.7%, Cr, Si 0.25%, Mn 1.6%), -, - , ( 1500 0 =8.4*10-7) .


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, . . 1) , .. 2) , .. 2) 1) Uni versity of Ant werp, Ant werp, Belgiu m - , . ,

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. 50 100 10 20°, «zigzag» «armchair»- . /1/, . . 2--0 -45116 . 1. W. Brenner, O.A. Shendero va, J. A. Harrison, S.J. Stuart, B. Ni, S.B. Sinnot, //J. Phys: Condens. Matter, 2002, 14, 783. Si
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.., .., .., .., . . - , , Xe+ - - Si n+ n=1-11 . Sin+ (n=2-10) ~10-6-10-5 ~10-5-10-4 . , Sin+ Sin+ Si+n-1+Si + Si n-1 Sin+. , , Sin+ /1/. , Sin+ , , Si . Sin+ ( ), . /1/ , . 1. .. // . 2012. 8. C.28-34. , Mo,W, Ti . . , .. ... , , , , , .. -, , . , , , . () () 210-9 , W Ti Nb+, Ba+ c 0=3. ~0,1 ( Nb+) ~2 ( Ba+). , . 900-1000 -Ba -Nb. , Nb- Nb =1400. .


.. - , , , e-mail: morozo v@aie.uz () , . GaAs Biq+ (q=1-6) 1­ 10 . (Ga+, Ga2+, As+ ), (C+, H2O+, Na+, Al+, K+, Ni+, Cu+, Cs+, Bin+) Biq+. 1 5,6. , . , . Siq+ /1/. . 1. Morozo v S.N. // ISSN 1027_4510, Journal of Surface In vesti gation. X_ray, Synchrotron an d Neutron Techniques, 2012, Vol. 6, No. 4, p. 660. . ., ., .., .. - , , . Cu Ag. , v 1-1,5 , v . , -, . , , .. (=00) , , . , . , . v . , , . , <100>, <110>, <112> Cu Ag , , . , - . . , , - , - , , , , .. , , , , . Si-Al . Si Al (, , N), 1-1,2 %. , , , Si Al : Mg, Cu, Mn, Cr, Si, Ti, Fe, Zn ( Al) Na, K, Li, As, Ca, Fe, Cu, Zn ( Si). , Al-Si AlO, Al2O3 SiO, SiO2. , , . . , , .


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, Ba+, Na+ Sr+ (0 = 0,5 ­ 5 ) CaF2 . . , , . CaF2/Si(111) CoSi2/Si(111) . CaF2 + 0 = 0,5 D = 1014 -2 5-10 , D = 1015 -2 100 ­ 200 , D 1016 -2 . , 1-2 . ( 55­60 .%) (25 ­3 0 .%), ( 15­20 .%). = 1000 Ca0,4Ba0,6F2. + CoSi2. CaF2 .

BaSi2, CoSi2 SiO2, Si .. , . , .., , .. , , BaSi2 CoSi2, SiO2, . SiO2 (d = 200 å d = 1000 å).

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, SiO2/Si d = 200 å -2,9; -6,5 -9,6 . SiO2 , (d = 200å) (d = 1000 å) ( 0,5 ­ 1 ) ( ) . - SiO2 ­ SiO (1 < x < 2). Si ­ Si.


THE DISSOLVING OF GO LD NANOP ARTIC LES IN SILIC ATE GLASS UNDER THE AC TION OF ELEC TRON BEAM IRRADIATION O.A. Pods viro v1, V. A. Bruno v2, M.. Prosniko v1, A. I. Sidoro v2 1 SPb State Polytech. Uni versity, Saint-Petersburg, Russia 2 SPb National Research Uni versity of In formation Techno-lo gies, Mechanics and Optics, Saint-Petersburg, Russia Electron beam is the po werful instru ment for the modification of glasses and glass co mposites structure and properties. Earlier we have sho wn that the action of 200 k eV electrons on glasses containing sil ver nanoparticles led to the dis sol vin g of nanoparticles in glass volu me /1/. The ai m of the present wo rk is the in vestigation of gold n anoparticles dissolving near the gl ass surface under the action of low energy el ectrons. In our experi ment we used polished plates of colored optical silicate glass PS8, containing gold nanoparticles with the size 10-50 nm. Th e samples were irradiated b y electrons with energies 5 -10 keV and dose 20-50 mQ/cm2 using JEBD-2 scanning electron microscope at roo m temp erature. The experi ments have shown that durin g electron irradiation the negati vely charged region near the glass surface is formed. The strong electric field produced b y this charged region led to the tearin g off the positi ve gold ions fro m the gold nanopar ticles and to the field mi gration of gold ions to the glass surface. As a result the thin gold metal film is fo rmed on a glass surface. This effect can be used for the fab rication of micro mirrors for the photonics devices. R EFER ENC ES 1. A.V. Nashchekin, V.N. Nevedo msky, O. A. Pods viro v, A. I. Sidoro v, O. A. Uso v. // Int. J . of Nanosci. V. 10, N 6, P.1265. 2011.