ÈÑÒÈÍÀ

Behnke J.F.

Ñîàâòîðû: Êîçëîâ Ê.Â., Sonnenfeld A., Brandenburg R., H-E W., Michel P., Golubovskii Y.B., Maiorov V.A., Wagner H.E.

5 ñòàòåé, 1 äîêëàä íà êîíôåðåíöèè, 1 òåçèñû äîêëàäà

Êîëè÷åñòâî öèòèðîâàíèé ñòàòåé â æóðíàëàõ ïî äàííûì Scopus: 409, Web of Science: 365

IstinaResearcherID (IRID): 436888

Äåÿòåëüíîñòü ñòèëü:  îáû÷íûé | ÃÎÑÒ | plain | abbrv | acm | alpha | amsalpha | amsplain | apalike | ieeetr | siam

• Ñòàòüè â æóðíàëàõ

  • 
    • 2003 THE BARRIER DISCHARGE: BASIC PROPERTIES AND APPLICATIONS TO SURFACE TREATMENT
    • Wagner H.E., Brandenburg R., Kozlov K.V., Sonnenfeld A., Michel P., Behnke J.F.
    • â æóðíàëå Vacuum, èçäàòåëüñòâî Pergamon Press Ltd. (United Kingdom), òîì 71, ? 3 SPEC., ñ. 417-436
  • 
    • 2003 The barrier discharge: basic properties and applications to surface treatment
    • Wagner H.E., Brandenburg R., Kozlov K.V., Sonnenfeld A., Michel P., Behnke J.F.
    • â æóðíàëå Vacuum, èçäàòåëüñòâî Pergamon Press Ltd. (United Kingdom), òîì 71, ñ. 417-436

• Ñòàòüè â ñáîðíèêàõ

  • • 2003 Spatio-temporal development of the diffuse barrier discharge in nitrogen
    • Brandenburg R., Maiorov V.A., Golubovskii Yu B., H-E Wagner, Kozlov K.V., Behnke J.F., Michel P.
    • â ñáîðíèêå Proc. XXVI Int. Conf. on Phenomena in Ionized Gases (ICPIG-26, ìåñòî èçäàíèÿ Greifswald, Germany, òîì 4, ñ. 47-48
  • • 2001 Influence of noble gases on the reaction of plasma-chemical decomposition of silicon-organic compounds in the dielectric barrier discharges
    • Sonnenfeld A., Kozlov K.V., Behnke J.F.
    • â ñáîðíèêå Proc. 15th Int. Symp. Plasma Chem, ìåñòî èçäàíèÿ Orl?ans, France, òîì 5, ñ. 1829-1834
  • • 2000 Catalytic effect of noble gases in the reaction of plasma-chemical decomposition of hexamethyldisiloxane in the dielectric barrier discharge
    • Kozlov K.V., Sonnenfeld A., Behnke E.F.
    • â ñáîðíèêå Proc. 7 Int. Symp. on High Pressure Low Temperature Plasma Chemistry, ìåñòî èçäàíèÿ Greifswald, Germany, òîì 2, ñ. 247-251

• Äîêëàäû íà êîíôåðåíöèÿõ

  • • 2000 Catalytic effect of noble gases in the reaction of plasma-chemical decomposition of hexamethyldisiloxane in the dielectric barrier discharge
    • Àâòîðû: Êîçëîâ Ê.Â., Sonnenfeld A., Behnke J.F.
    • 7-th International Symposium on High Pressure Low Temperature Plasma Chemistry (HAKONE-VII), Greifswald (Germany), Ãåðìàíèÿ, 2000

• Òåçèñû äîêëàäîâ

  • • 2001 Influence of noble gases on the reaction of plasma-chemical decomposition of silicon organic compounds in the dielectric barrier discharge
    • Kozlov K.V., Sonnenfeld A., Behnke J.F., H-E Wagner
    • â ñáîðíèêå 10 Bundesdeutsche Fachtagung Plasmatechnologie, ìåñòî èçäàíèÿ Greifswald, Germany, òåçèñû, ñ. 80-80