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Malykhin E.M.

Ñîàâòîðû: Ëîïàåâ Ä.Â., Çûðÿíîâ Ñ.Ì., Ðàõèìîâà Ò.Â., Êîâàëåâ À.Ñ., Ðàõèìîâ À.Ò., Âàñèëüåâà À.Í., Áðàãèíñêèé Î.Â., Ìàíêåëåâè÷ Þ.À., Koshelev K.N., Krivtsun V.M., Baklanov M.R., Ïðîøèíà Î.Â., Êðèâ÷åíêî Â.À. ïîêàçàòü ïîëíîñòüþ..., Âîëîøèí Ä.Ã., Glushkov D., van Kaampen M., Yakushev O.F.

11 ñòàòåé

Êîëè÷åñòâî öèòèðîâàíèé ñòàòåé â æóðíàëàõ ïî äàííûì Scopus: 52, Web of Science: 50

IstinaResearcherID (IRID): 468380

Äåÿòåëüíîñòü ñòèëü:  îáû÷íûé | ÃÎÑÒ | plain | abbrv | acm | alpha | amsalpha | amsplain | apalike | ieeetr | siam

• Ñòàòüè â æóðíàëàõ

  • 
    • 2012 Removal of amorphous C and Sn on Mo:Si multilayer mirror surface in Hydrogen plasma and afterglow
    • Braginsky O.V., Kovalev A.S., Lopaev D.V., Malykhin E.M., Rakhimova T.V., Rakhimov A.T., Vasilieva A.N., Zyryanov S.M., Koshelev K.N., Krivtsun V.M., van Kaampen Maarten, Glushkov D.
    • â æóðíàëå Journal of Applied Physics, èçäàòåëüñòâî American Institute of Physics (United States), òîì 111, ? 9, ñ. 093304-093304 DOI
  • 
    • 2011 Loss of Hydrogen Atoms in H-2 Plasma on the Surfaces of Materials Used in EUV Lithography
    • Zyryanov S.M., Kovalev A.S., Lopaev D.V., Malykhin E.M., Rakhimov A.T., Rakhimova T.V., Koshelev K.N., Krivtsun V.M.
    • â æóðíàëå Plasma Physics Reports, èçäàòåëüñòâî Maik Nauka/Interperiodica Publishing (Russian Federation), òîì 37, ? 10, ñ. 881-889 DOI
  • 
    • 2011 Plasma Cleaning of Multilayer Mirrors in EUV Lithography from Amorphous Carbon Contaminations
    • Malykhin E.M., Lopaev D.V., Rakhimov A.T., Rakhimova T.V., Braginskii O.V., Kovalev A.S., Vasil?eva A.N., Zyryanov S.M.
    • â æóðíàëå MOSCOW UNIVERSITY PHYSICS BULLETIN, òîì 66, ? 2, ñ. 184-189 DOI
  • 
    • 2011 Surface recombination of oxygen atoms in O-2 plasma at increased pressure: I. The recombination probability and phenomenological model of surface processes
    • Lopaev D.V., Malykhin E.M., Zyryanov S.M.
    • â æóðíàëå Journal of Physics D - Applied Physics, èçäàòåëüñòâî Institute of Physics Publishing (United Kingdom), òîì 44, ? 1, ñ. 015201 DOI
  • 
    • 2011 Surface recombination of oxygen atoms in O-2 plasma at increased pressure: II. Vibrational temperature and surface production of ozone
    • Lopaev D.V., Malykhin E.M., Zyryanov S.M.
    • â æóðíàëå Journal of Physics D - Applied Physics, èçäàòåëüñòâî Institute of Physics Publishing (United Kingdom), òîì 44, ? 1, ñ. 015202 DOI
  • 
    • 2011 The Effect of He Plasma Treatment on Properties of Organosilicate Glass Low-K Films
    • Braginsky O.V., Kovalev A.S., Lopaev D.V., Malykhin E.M., Mankelevich Yu A., Proshina O.V., Rakhimova T.V., Rakhimov A.T., Voloshin D.G., Vasilieva A.N., Zyryanov S.M., Smirnov E.A., Baklanov M.R.
    • â æóðíàëå Journal of Applied Physics, èçäàòåëüñòâî American Institute of Physics (United States), òîì 109, ? 4, ñ. 043303 DOI
  • 
    • 2011 The structure of thin carbon films deposited at 13.5 nm EUV irradiation
    • Malykhin E.M., Krivchenko V.A., Lopaev D.V., Rakhimova T.V., Zyryanov S.M.
    • â æóðíàëå MOSCOW UNIVERSITY PHYSICS BULLETIN, òîì 66, ? 1, ñ. 54-58 DOI
  • 
    • 2010 The Mechanism of Low-K SiOCH Film Modification by Oxygen Atoms
    • Braginsky O.V., Kovalev A.S., Lopaev D.V., Malykhin E.M., Mankelevich Yu A., Rakhimova T.V., Rakhimov A.T., Vasilieva A.N., Zyryanov S.M., Baklanov M.R.
    • â æóðíàëå Journal of Applied Physics, èçäàòåëüñòâî American Institute of Physics (United States), òîì 108, ? 7, ñ. 073303 DOI

• Ñòàòüè â ñáîðíèêàõ

  • • 2010 In-Line Plasma Cleaning of EUV Multilayer Mirrors
    • Malykhin E.M., Braginsky O.V., Kovalev A.S., Lopaev D.V., Rakhimov A.T., Rakhimova T.V., Vasilieva A.N., Zyryanov S.M., Koshelev K.N., Krivtsun V.M., Yakushev O.F.
    • â ñáîðíèêå Bulletin of the American Physical Society, 63rd Gaseous Electronics Conference & 7th International Conference on Reactive Plasmas, October4-8 2010, Paris, France, ñåðèÿ 7, ìåñòî èçäàíèÿ Paris, France, òîì 55
  • • 2009 Radical Production in RF CCP Discharge at 81 MHz Frequency in CHF3/Ar and CF4/Ar Mixtures. Theory and Experiment
    • Malykhin E.M., Braginsky O.V., Kovalev A.S., Lopaev D.V., Proshina O.V., Rakhimova T.V., Rakhimov A.T., Vasilieva A.N., Zyryanov S.M.
    • â ñáîðíèêå Proceedings of International Symposium on Plasma Chemistry (ISPC 19), July 27-31 2009, Bochum, Germany, ìåñòî èçäàíèÿ Bochum, Germany, ñ. 362
  • • 2008 Recombination Probabilities of Î and Í Atoms on the Surface of Nanoporous Low-K SiOCH Dielectrics
    • Braginsky O.V., Kovalev A.S., Lopaev D.V., Malykhin E.M., Mankelevich Yu A., Rakhimova T.V., Rakhimov A.T., Vasilieva A.N., Zyryanov S.M., Baklanov M.R.
    • â ñáîðíèêå Proceedings of Advanced Metallization Conference (AMC), September 23-25 2008, San Diego California, USA, and October 8-10 2008, Tokyo, Japan, ìåñòî èçäàíèÿ San Diego California, USA, and Tokyo, Japan